Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Fraunhofer Institute for Applied Optics and Precision Engineering IOF

EUV Schwarzschild objective

The advantages and construction of Schwarzschild objectives

 

Schwarzschild objectives are increasingly used in the EUV spectral region as imaging optics because of their large aperture, high mechanical stability, and freedom from chromatic aberrations. An EUV Schwarzschild objective is made of a primary and a secondary Mo/Si coated multilayer mirror, on which both spheres and aspheres can be used. The optical elements are stress-free and were mounted mechanically stable using solid state hinges. It is possible to correct the mirror adjustment during operation.

Our services

 

  • Design and fabrication of Schwarzschild objectives for the EUV spectral region according to customized requirements
  • Coating of Schwarzschild objectives with laterally graded Mo/Si multilayers, Transmission: T > 45 % @ 13,5 nm
  • Dimensioning, calculation and realization of the mirror mounting system

 

Our competences in the field of EUV objectives

 

  • Realization of diffraction-limited optical assembly for 13.5 nm wavelength with a resolution of < 20 nm
  • EUV optics design according to customized requirements
  • Fabrication of coated optics components for 13.5 nm
  • Mechanics design and construction of optical assembly
  • Low-stress mounting of optical components, ensuring minimum deformation of optical surfaces
  • Positioning accuracy of optical surfaces: < 1.5 µm lateral misalignment, < 10 µm axial offset
  • Hydrocarbon-free mounting design
Optical components and radiation sources.
© Fraunhofer IOF
Optical components and radiation sources for applications in the X-ray range - A joint project of several Fraunhofer Institutes.
Front side of Schwarzschild objective.
© Fraunhofer IOF
EUV Schwarzschild objective for applications in EUV lithography. Schwarzschild objectives for applications in the EUV spectral range consist of a concave and a convex Mo/Si multilayer mirror.
Back side of Schwarzschild objective.
© Fraunhofer IOF
Depending on the optical path applications in microscopy or lithography can be realized. The integration of a laser plasma source allowed for the direct structuring of selected materials.

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We develop customized solutions for photonic problems from industry and science.

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If you have any questions about the cooperation with Fraunhofer IOF, you can find more information under the following link: 

 

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We develop new coatings and optical systems on customer request.

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Further information

EUV/XUV coatings

Learn more about the possibilities and the range of services in the field of coatings and coating systems in the extreme ultraviolet spectral range at Fraunhofer IOF.

EUV/XUV coatings

Characterization of EUV components

At Fraunhofer IOF we offer research and development services for the characterization of reflection and scattered light properties of EUV coating systems. 

Characterization of EUV components

Functional Surfaces and Coatings

Get an overview of the entire range of services offered by our scientific department "Functional Surfaces and Coatings" at Fraunhofer IOF.

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