Motivation
On-site characterization of optical components for EUV Lithography
System Parameter
- Operation wavelength: 13.5 nm
- Angles of incidence: 1,5° - 85°
- Angular resolution: 0,01°
- Sensitivity: 10-5
Realization
Laboratory-based instrument for the Measurement of EUV Reflectance and Scattering - MERLIN
We offer
- Measurement of:
- EUV Reflectance
- Angle Resolved Scatter
- Subsequent analysis
- Determination of Total Scatter
- Link to structural properties
- Development of custom-designed EUV measurement systems