Characterization of Surfaces and Thin Films

laboratory equipment, measurement systems

typ / producer

specifications (measuring range/resolution/accuracy)

scattered light measurement

angle resolved scattered light measurement "Albatross" 

self-made

loss mechanisms, nanostructures, particles, defects ( UV - VIS – IR)  (157 nm - 1064 nm)

angle resolved scattered light measurement - "Vulstar" 

self-made

loss mechanisms, nanostructures, particles, defects (VUV: 157, 193 nm)

total scattered light measurement

self-made

loss mechanisms, nanostructures, particles, defects  (157 nm - 10,6 µm)

scattered light - and reflexions measurement system at 13 nm - "Merlin"

self-made

loss mechanisms, nanostructures

scattered light based roughness sensor "horos"

self-made

loss mechanisms, nanostructures, particles, defects

table-top scattered light measurement system "Albatross TT"

self-made

loss mechanisms, nanostructures, particles, defects

spectral photometer (120 nm - 50 µm)

scanning force microscopy (AFM)

AFM 1

VEECO D3100 (2002)

nanostructures

AFM 2

VEECO D3000 (1996)

nanostructures

large range AFM

SIS Nanostation 300

nanostructures

scanning electron microscopy

Philips

laser scanning microscope

white light interferometry (WLI)

WLI 1

self-made

nano and micro structures < 2 nm RMS (measuring range up to 100 µm), < 25 nm RMS (measuring range up to 500 µm),

WLI 2

Zygo NewView 7300

nano and micro structures (< 1 nm vertical resolution, measuring fields 50 x 50 µm bis 5 x 5 mm, Stiching up to several square millimeter, automated processes)

WLI 3

Zygo New 6000

nano and micro structures (< 1 nm RMS, inclination adjustment using a swiveling measurement head)

confocal microscopy

Zeiss LSM 510

nano and micro structures

nomarski microscopy (DIC)

Leica

nano structures, defects

laser-ratiometric T,R - measurement in VUV (157 nm, 193 nm)

self-made

X-ray diffractometry (XRD), -reflectometry

Bruker D8

coating thickness, roughness, density, crystal structur (wavelength 0.154 nm)

Bruker D5005

coating thickness, roughness, density, crystal structur (wavelength 0.154 nm)

microscopy photometry

Zeiss

T/R-measuring (UV/VIS)

spectroscopic ellipsometry

mechanical profilometry (Talysurf 6c, Talysurf PGI+)

TaylorHobson

surface: shape and roughness (measuring range 120 x 100 mm, calibration at 100 nm)

measurement techniques for testing of long-term stability and adhesion
of optical coatings, climate testing

microscope with image processing

Olympus

nano structures, defects (microscope BX 51 (DIC))

microscope with image processing

Olympus

nano structures, defects (stereo microscope SZX 9)

FTIR-spectrometer

Varian

polymer surfaces, coatings  ATR, IRRAS included

contact angle measuring station (static)

self-made

contact angle measuring station, dynamic)

Dataphysics DCA 20

liquid contact angle

auto-focus system

UBM

VUV-Spectrometer

LZH

120–230 nm, Ts,Tp,Rs,Rp with 0 - 80°

UV/VIS/NIR-spectrometer

PE Lambda 19

180–3000 nm, 6° and 45°

UV/VIS/NIR-spectrometer

PE Lambda 900

170–3000 nm, 6° and 45°

UV/VIS-spectrometer

PE Lambda 850

170–900 nm

Faber spectrometer

Zeiss MCS 400

200–1000 nm, up to 500°C

OptiMon

Eigenbau

400–920 nm, 4 ms measuring duration

UV-microscope

Leica

spectral auto-focus microscope + software MarkIII

Miroprof/ Jurca, FRT

100 mm x 100 mm (scanning), zmax 300 µm , dz10 nm, coating 25–200 µm

surface thickness measuring system/ spectral reflection

FTP advanced/ Sentech

50 nm...30 µm, time-independent, library n,k (400...900 nm)