EUV-measurement system MERLIN

Motivation

On-site characterization of optical components for EUV Lithography

 

System Parameter

• Operation wavelength: 13.5 nm
• Angles of incidence: 1,5° - 85°
• Angular resolution: 0,01°
• Sensitivity: 10^-5

 

Realization

Laboratory-based instrument for the Measurement of EUV Reflectance and Scattering - MERLIN

 

We offer

• Measurement of:

• EUV Reflectance
• Angle Resolved Scatter

• Subsequent analysis

• Determination of Total Scatter
• Link to structural properties

• Development of custom-designed EUV measurement systems