Metrology benches with integrated electrostatic wafer chuck which are used in ion beam illumination systems in high vacuums are developed at Fraunhofer IOF. The bench assembly comprises a metrology unit with attached interferometry mirrors, an electrostatic wafer chuck with 5 N/cm2 and an integrated, mobile chuck for wafer handling.
Requirements
- Positioning accuracy < 30 nm
- Time per exposure: 0.2 s (including positioning)
Mechanical modeling (FEM)
- Structural analysis with the objective:
- Deformation of the metrology unit < 40 nm below own weight
- Natural frequency > 200 Hz
- Investigation of thermo-mechanical properties
- Design of kinematic suspension
Design of a lightweight structure
- Use of special materials:
- Ceramic SiSiC
- ZERODUR®
- Technological development for:
- Manufacture
- Assembly
- Joining technology (bonding)
- Tolerances of the interferometer mirror set-up
- Orthogonal ± 2“
- Pyramidal ± 30“