Silicon Optics

In association with companies, the Fraunhofer IOF is investigating a new technology to deposit X-ray amorphous silicon layers on ultra-precise substrates with excellent bonding and low strain in the necessary layer thickness for polishing using magnetron sputtering. The challenge in manufacturing complex optical components such as aspheres or free forms for the visual and ultraviolet spectral range lies in polishing the Si-substrate surfaces following ultra-precision processing.

Current results show that surface roughnesses of less than 1 nm RMS can be achieved using diverse polishing methods. The technology is suitable for the production of optical elements for applications from the infrared to the ultraviolet spectral range.